Werner Zapka
7Patents
7h-index
21Co-inventors
59Inventor score
Filing activity: Jan 25, 1985 → Dec 6, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5326426A | Undercut membrane mask for high energy photon patterning | Emerging Cross-Sectional Technologies | 39 | Expired |
| US4855197A | Mask for ion, electron or X-ray lithography and method of making it | Emerging Cross-Sectional Technologies | 35 | Expired |
| US4980536A | Removal of particles from solid-state surfaces by laser bombardment | Physics | 33 | Expired |
| US6796630B2 | Droplet deposition apparatus | Performing Operations; Transporting | 21 | Expired |
| US5055383A | Process for making masks with structures in the submicron range | Electricity | 20 | Expired |
| US4578587A | Error-corrected corpuscular beam lithography | Electricity | 12 | Expired |
| US4724392A | System for testing magnetic head/disk interfaces | Physics | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.