Method and apparatus for high efficiency scanning in an ion implanter
US4980562A · kind A · utility
66Cited by
24References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 7, 1989 |
| Grant date | Dec 25, 1990 |
| Priority date | — |
| Expiry date | Nov 7, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3171
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion beam scanning method and apparatus produce a parallel, scanned ion beam with a magnetic deflector having, in one instance, wedge-shaped pole pieces that develop a uniform magnetic field. A beam accelerator for the scanned beam has a slot-shaped passage which the scanned beam traverses. The beam scan and the beam traverse over a target object are controlled to attain a selected beam current and corresponding ion dose on a target object. Methods and apparatus are disclosed for increasing ion beam utilization efficiency without adversely effecting dose accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.