Charged particle beam exposure system using line beams
US4980567A · kind A · utility
29Cited by
7References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 1989 |
| Grant date | Dec 25, 1990 |
| Priority date | — |
| Expiry date | Mar 28, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3007
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a charged particle beam exposure system, a line of individual blanking apertures (39.sub.0 to 39.sub.255) is provided to form a line of beams which are individually blanked and unblanked by applying voltages to electrodes within the blanking apertures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.