Process for fabrication of device
US4981770A · kind A · utility
7Cited by
3References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 28, 1989 |
| Grant date | Jan 1, 1991 |
| Priority date | — |
| Expiry date | Jul 28, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The use of a surface treatment approach to lithography, depending on a radiation-induced change in hydrophilicity, shows particular promise for deep UV, vacuum ultraviolet and x-ray lithography. For example, hydrophobic chlorinated polystyrene is selectively irradiated in the presence of oxygen producing local hydrophilic regions. Subsequent treatment of these hydrophilic regions with water followed by an organometallic or inorganic gas such as TiCl.sub.4 yields a patterned, surface metal oxide suitable as, for example, an etch mask for further patterning of the underlying polymer film and device regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.