Processing for stripping organic material
US4983254A · kind A · utility
46Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 4, 1990 |
| Grant date | Jan 8, 1991 |
| Priority date | — |
| Expiry date | Jan 4, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/427
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process for stripping an organic material, which comprises forming gases including a gas containing oxygen and a gas containing a halogen into plasma in a plasma chamber, and supplying an active species of the halogen in the gas formed plasma to a reaction chamber to strip the organic material in the reaction chamber, wherein one mole or more of water vapor based upon two moles of the halogen molecule is fed to the reaction chamber, and the active species of the halogen are removed before contact thereof with the organic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.