Distributed ECR remote plasma processing and apparatus
US4996077A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 1988 |
| Grant date | Feb 26, 1991 |
| Priority date | — |
| Expiry date | Oct 7, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3341
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A distributed electron cyclotron resonance remote plasma processing apparatus and method which includes generating electron cyclotron resonance activated species in plasma formation regions distributed peripherally around, remote from the wafer processing chamber and in fluid communication with the main transfer chamber; containing the activated species using a microwave gas discharge and a magnetic field in the plasma formation regions; introducing the plasma streams to the main transfer chamber; creating a magnetic mirror in the main transfer chamber using a magnetic field; and introducing the species to the process chamber and to a face of the workpiece. Such an apparatus could use multiple energy/excitation sources.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.