Method for etching tungsten
US4997520A · kind A · utility
21Cited by
11References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 1988 |
| Grant date | Mar 5, 1991 |
| Priority date | — |
| Expiry date | Jun 10, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F4/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for etching a tungsten film which includes introducing activated species of a halogenated hydrocarbon to the tungsten film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.