Method for the formation of a diffraction grating
US4997747A · kind A · utility
19Cited by
5References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 5, 1988 |
| Grant date | Mar 5, 1991 |
| Priority date | — |
| Expiry date | Oct 5, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for the formation of a diffraction grating on a substrate using a holographic technique and an etching technique, wherein the periodicity of the pattern of the diffraction grating can be changed at will by a change of the light-path length of one of the two light fluxes from a holographic exposing system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.