Plasma CVD apparatus
US4998968A · kind A · utility
13Cited by
7References
40Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 23, 1989 |
| Grant date | Mar 12, 1991 |
| Priority date | — |
| Expiry date | Aug 23, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma CVD apparatus for forming a deposition film on a base by causing a discharge in a space between the base and an electrode has an auxiliary member removably arranged in electrical contact to the electrode on a face of the electrode which contributes to the discharge. The auxiliary member thus acts as the electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.