Method and apparatus for in situ cleaning of excimer laser optics
US5001873A · kind A · utility
125Cited by
5References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 26, 1989 |
| Grant date | Mar 26, 1991 |
| Priority date | — |
| Expiry date | Jun 26, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for cleaning the optical elements in an excimer laser in situ. A source of high pressure carbon dioxide gas is allowed to escape through a nozzle facing the surface of the optical elements. The escaping gas expands and cools sufficiently to form a carbon dioxide ice jet. The ice jet strikes the surface of the optical elements causing cleaning of the elements by abrasion. Carbon dioxide may be removed merely by evacuation and purging of the system. Thus the mirrors are cleaned without removing them.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.