Exposure apparatus and control of the same
US5008703A · kind A · utility
16Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 6, 1989 |
| Grant date | Apr 16, 1991 |
| Priority date | — |
| Expiry date | Sep 6, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Exposure apparatus and control of the same, for exposing a semiconductor wafer to a mask with a predetermined radiation energy, for manufacture of semiconductor devices, is disclosed. During a time period in which the mask-to-wafer alignment or the exposure of the wafer to the mask is made, the operation of any other driving device that has no participation in the aligning operation or the exposure operation, is prohibited. This ensures high-precision pattern printing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.