Microwave plasma CVD apparatus with plasma generating chamber constituting a cylindrical cavity resonator
US5010276A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 3, 1988 |
| Grant date | Apr 23, 1991 |
| Priority date | — |
| Expiry date | Oct 3, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32192
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A microwave plasma CVD apparatus which comprises a treating chamber having means for supporting a body to be treated therein, a plasma generating chamber connected to the treating chamber through a metal mesh, means for introducing a gas into the plasma generating chamber, and means for introducing microwave to convert the gas into a plasma. An embodiment thereof is characterized in that an oscillator for the microwave performs continuous oscillation, the plasma generating chamber constitutes a cylindrical cavity resonator surrounded by the metal mesh and a stop or stops, and a bell-jar smaller than the cavity in length and much smaller than the cavity in inside diameter is disposed in the cavity resonator in contact with the metal mesh to constitute a reentrant cylindrical cavity resonator through control of the position of the stop and the open area ratio of the aperture of the stop. The other embodiment is characterized in that an oscillator for the microwaves performs continuous oscillation, the plasma generating chamber constitutes a cavity surrounded by the mesh and a stop or stops, a bell-jar internally contacting the cavity is disposed in contact with the mesh, and the posi…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.