Hiroshi Echizen
28Patents
13h-index
38Co-inventors
81Inventor score
Filing activity: Oct 28, 1985 → Oct 28, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5520740A | Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same | Emerging Cross-Sectional Technologies | 43 | Expired |
| US5714010A | Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same | Emerging Cross-Sectional Technologies | 39 | Expired |
| US5171965A | Exposure method and apparatus | Physics | 38 | Expired |
| US5527391A | Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method | Emerging Cross-Sectional Technologies | 37 | Expired |
| US5114770A | Method for continuously forming functional deposited films with a large area by a microwave plasma CVD method | Emerging Cross-Sectional Technologies | 32 | Expired |
| US5130170A | Microwave PCVD method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation | Emerging Cross-Sectional Technologies | 29 | Expired |
| US6273955A | Film forming apparatus | Emerging Cross-Sectional Technologies | 29 | Expired |
| US5510151A | Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space | Emerging Cross-Sectional Technologies | 22 | Expired |
| US6350489B1 | Deposited-film forming process and deposited-film forming apparatus | Chemistry; Metallurgy | 21 | Expired |
| US4799791A | Illuminance distribution measuring system | Physics | 21 | Expired |
| US6113732A | Deposited film forming apparatus | Chemistry; Metallurgy | 16 | Expired |
| US5069928A | Microwave chemical vapor deposition apparatus and feedback control method | Chemistry; Metallurgy | 15 | Expired |
| US6338872B1 | Film forming method | Emerging Cross-Sectional Technologies | 13 | Expired |
| US4717242A | Illumination optical system | Physics | 12 | Expired |
| US5010276A | Microwave plasma CVD apparatus with plasma generating chamber constituting a cylindrical cavity resonator | Electricity | 11 | Expired |
| US4626449A | Method for forming deposition film | Electricity | 11 | Expired |
| US4806773A | Wafer position detecting method and apparatus | Electricity | 9 | Expired |
| US6930025B2 | Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6783640B2 | Sputtering method and sputtering apparatus | Chemistry; Metallurgy | 4 | Expired |
| US6253703A | Microwave chemical vapor deposition apparatus | Chemistry; Metallurgy | 4 | Expired |
| US7641382B2 | Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program | Physics | 4 | Active |
| US5700326A | Microwave plasma processing apparatus | Electricity | 3 | Expired |
| US6821317B2 | Wet-process gas treatment method and wet-process gas treatment apparatus | Performing Operations; Transporting | 1 | Expired |
| US6860974B2 | Long-Term sputtering method | Electricity | 1 | Expired |
| US7288140B2 | Wet process gas treatment apparatus | Performing Operations; Transporting | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.