Process of using an electrically conductive layer-providing composition for formation of resist patterns
US5019485A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 12, 1989 |
| Grant date | May 28, 1991 |
| Priority date | — |
| Expiry date | Oct 12, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/093
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Electrically conductive layer-providing compositions comprising a conducting or semiconducting polymer and/or a non-conducting precursor thereof and a photo-acid generator having a sensitivity to an ultraviolet radiation having a wavelength of 300 nm or less. The electrically conductive layer, when an electron beam resist layer adjacent thereto is exposed to a pattern of the electron beam, can effectively prevent an accumulation of an electrical charge on the resist layer and accordingly a misalignment of the resist pattern. In addition, the compositions and electrically conductive layer resulting therefrom can be stably stored if not exposed to ultraviolet radiation. Pattern formation processes using the electrically conductive layer-providing compositions are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.