Device for generating X-radiation with a plasma source
US5023897A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 1990 |
| Grant date | Jun 11, 1991 |
| Priority date | — |
| Expiry date | Aug 16, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/52
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The invention is an improvement in a device for generating X-radiation with a plasma source. In the device, two concentric cylindrical electrodes (11, 12) are separated by an evacuated discharge space (13) filled with low-pressure gas. When the inner electrode is momentarily raised to an extremely high voltage, the gas is ionized and a plasma shock wave (17, 17') is created and compressed into a plasma focus (21) emitting X-radiation (20). The improvement introduces a first ("discharge") gas into the discharge space for initiation of the plasma, while introducing a second ("emitting") gas into the inner electrode for generating the X-radiation in the plasma focus. Special features of the improved device include a plurality of gas extraction ports, which can be used independently or together, and which can be combined with variations in the introduction and flow of the two gases to control the movement and intermixture of the gases and, thereby, the operation of the device. Also, the device introduces a third gas for improving the transmission of the X-radiation from the generating plasma focus to a work station for X-ray microscopy or for X-ray lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.