Method of stripping layers of organic materials
US5037506A · kind A · utility
42Cited by
2References
17Claims
0Family size
Inventors
Key dates
| Filing date | Sep 6, 1990 |
| Grant date | Aug 6, 1991 |
| Priority date | — |
| Expiry date | Sep 6, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/906
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Gaseous sulfur trioxide is used to remove various organic coatings, polymerized photoresist, and especially implant and deep-UV hardened photoresist layers, during the manufacture of semiconductor or ceramic devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.