Process for determining the focussing of a photolithographic apparatus

US5043236A · kind A · utility

Assignee

• Etat Francais represente par le Ministre des Postes, Telecommunications et de l'Espace · FR

Inventors

• Annie Tissier · Scottsdale, US
• Bruno Latombe · Saint-Martin-d'Hères, FR
• Alain Poncet · Grenoble, FR

Key dates

• Filing date: Dec 29, 1989
• Grant date: Aug 27, 1991
• Expiry date: Dec 29, 2009

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F9/7026
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In a process for determining the focussing of a photolithographic apparatus on a resist-coated wafer, comprising the following steps: 1) insolating, successively in various places, the resist by a test pattern, a different focussing being carried out for each insolation; 2) developing the resist; 3) observing the wafer for determing the optimal insolation and adopting the corresponding setting for the apparatus, it is provided, between steps 2) and 3), the step consisting in heating the wafer up to a temperature higher than the vitreous transition temperature of the resist.