Process for removing gaseous contaminating compounds from carrier gases containing halosilane compounds

US5051117A · kind A · utility

Assignee

• Wacker-Chemitronic Gesellschaft fur Elektronik Grundstoffe mbH · DE

Inventors

• Helene Prigge · Unterschleißheim, DE
• Robert Rurlander · Burgkirchen an der Alz, DE
• Harald Hoffman · Mannheim, DE
• Hans-Peter Bortner · Burghausen, DE

Key dates

• Filing date: Dec 20, 1990
• Grant date: Sep 24, 1991
• Expiry date: Dec 20, 2010

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S95/902
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A process for removing contaminants, particularly dopant, from halosilane-containing carrier gases, such as those which are produced in the production of high-purity silicon. The process of the invention is perferably carried out with aid of zeolites which has a low proportion of aluminum and are used in the anhydrous state by bringing the zeolites into contact with the carrier gases. Zeolites, after use, can be regenerated and re-used by increasing the temperature and/or decreasing the pressure of the procedure.