Photoacid generating composition and sensitizer therefor
US5055439A · kind A · utility
22Cited by
4References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 27, 1989 |
| Grant date | Oct 8, 1991 |
| Priority date | — |
| Expiry date | Dec 27, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/031
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition including an initiator which generates acid upon exposure to radiation in the presence of a sensitizer. The composition may be mixed with an acid sensitive polymer or prepolymer to make a visible light or laser imageable photoresist. The sensitizer has phenylethynyl and methoxy substituents which, when properly positioned, allow it to utilize all of the visible argon ion laser lines.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.