Photosensitive material having a silicon-containing polymer
US5057396A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Sep 21, 1989 |
| Grant date | Oct 15, 1991 |
| Priority date | — |
| Expiry date | Sep 21, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/26
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A silicon-containing polymer comprising repeating units of silicon-containing cyclic compound, represented by a general formula (I) ##STR1## (wehrein m and n are positive integers including 0, respectively, however m+n>0, and X is any of alkyl group, alkoxy group, phenyl group, naphthyl group, substituted phenyl group and substituted naphthyl group or a mixture of these, and the substituent of said substituted phenyl group or substituted naphthyl group indicates any of halogen atom, halogenated alkyl group, amino group, aminoalkyl group and nitro group or a mixture of these), and a photosensitive material containing said silicon-containing polymer are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.