Patent · US Expired

Method for making polyimide microlithographic compositions soluble in alkaline media

US5057399A · kind A · utility

28Cited by
4References
16Claims
0Family size

Inventors

Key dates

Filing dateMar 31, 1989
Grant dateOct 15, 1991
Priority date
Expiry dateMar 31, 2009

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L63/00
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Nonamic acidic functionalized diamines and dianhydrides are condensed to produce abnormal acid functionalized polyamic acid/imide resins which surprisingly afford effective lift-off, by alkaline media, even after higher imidization.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.