Resist materials
US5066566A · kind A · utility
17Cited by
3References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 31, 1990 |
| Grant date | Nov 19, 1991 |
| Priority date | — |
| Expiry date | Jul 31, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A one component resist material useful for deep ultraviolet, x-ray, and electron radiation has been found. Such material involves a substituent that is sensitive to acid and a moiety in the chain which both induces scission and provides an acid functionally upon such scission.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.