Liquid source container device
US5069244A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 1990 |
| Grant date | Dec 3, 1991 |
| Priority date | — |
| Expiry date | Dec 28, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/4259
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A liquid source container device is used for a liquid gas source for a semiconductor manufacturing device. This container device includes a main body for containing a source liquid, to which a gas supply line for transferring the source liquid, and a source liquid delivery line for delivering the liquid are connected. The gas supply line has first and second gas supply valves provided thereon, and the liquid delivery line has first and second liquid delivery valves also provided thereon. A section of the gas supply line which is located between the first and second gas supply valves and a section of the liquid delivery line which is located between the first and second delivery valves are connected with each other by means of a purge line which has a purge valve provided thereon. By operating the purge line, the purge valve, and the four valves, the efficiency of purge-drying procedures carried out before and after transferring the source liquid, is improved, and therefore the container device, as well as the semiconductor manufacturing device can be prevented from being contaminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.