Method for selectively heating a film on a substrate
US5073698A · kind A · utility
41Cited by
7References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 23, 1990 |
| Grant date | Dec 17, 1991 |
| Priority date | — |
| Expiry date | Mar 23, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/543
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for selectively heating a film on a substrate. The film is provided with a different absorption characteristic for light than the absorption characteristic of the substrate. The specimen (combined film and substrate) is illuminated by light having a maximum intensity at a wavelength which will be substantially absorbed by the film and substantially not absorbed by the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.