Device manufacture involving lithographic processing
US5079112A · kind A · utility
54Cited by
4References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 1989 |
| Grant date | Jan 7, 1992 |
| Priority date | — |
| Expiry date | Aug 7, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on descrimination as between scattered and unscattered radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.