Photosensitive mixture

US5081000A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Eberhard Kuehn · Hemhofen, DE
• Albert Hammerschmidt · Erlangen, DE
• Erwin Schmidt · Baltmannsweiler, DE
• Hellmut Ahne · Königsee, DE

Key dates

• Filing date: Mar 16, 1990
• Grant date: Jan 14, 1992
• Expiry date: Mar 16, 2010

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/111
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention provides photosensitive mixtures consisting of a polymer and a photoactive component which meet the requirements placed on photoresists. The polymer has carboxylic acid anhydride groups or phenolic hydroxyl groups and the photoactive component is an N-alkylated or N-arylated 1.4-dihydropyridine or a 1.4- dihydropyridine derivative of the following structure: ##STR1## where the R group is a (substituted) aryl group, which, in the ortho position to the bond with the dihydropyridine ring, carries a NO.sub.2 group; and R.sup.3 is alkyl, cyclohexyl or phenyl.