Device for trapping gaseous compounds of refractory metals and pumping plant including same
US5084080A · kind A · utility
7Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 28, 1988 |
| Grant date | Jan 28, 1992 |
| Priority date | — |
| Expiry date | Nov 28, 2008 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D53/68
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A device for trapping gaseous compounds of refractory metals includes at least a vertically disposed elongated enclosure (1) in the form of a hollow cylindrical member (2), sealingly closed in its upper part via a cover (4), and having a hollow bottom (5) in its lower part. The enclosure is lined in the major part of the height of the member with a heat conductive lining (10) leaving within itself free vertical spaces from top to bottom; The enclosure includes a gas inlet opening (8) below the lower portion of the lining, a gas outlet opening (11) above the lining, a heater and heat insulation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.