Method and apparatus for forming a multiple-element thin film based on ion beam sputtering
US5089104A · kind A · utility
41Cited by
6References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1990 |
| Grant date | Feb 18, 1992 |
| Priority date | — |
| Expiry date | Dec 3, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Ion beams drawn out of a plurality of ion beam sources or neutralized beams derived therefrom are projected to a plurality of targets, and sputtered particles discharged from the targets are directed to a substrate. The composition of sputtered particles is measured in the vicinity to the substrate. The measured coomposition is compared with the predetermined reference value and the composition of sputtered particles is controlled based on the result of measurement. sputtered particles having a controlled composition distribution are deposited on the substrate thereby to form a multiple-element thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.