Ellipsometric control of material growth
US5091320A · kind A · utility
171Cited by
6References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 15, 1990 |
| Grant date | Feb 25, 1992 |
| Priority date | — |
| Expiry date | Jun 15, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1008
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for controlling the growth of a multispecies film. During the film growth, an ellipsometer continuously monitors the surface on which the film is growing. The ellipsometer data is used to calculate the effective complex dielectric constant of the thin-film/substrate structure. A sequence of such data is used in a model calculation to determine the composition of the top portion of the thin film. The measured composition is compared with the target composition and the amount supplied of one of the species is correspondingly changed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.