Exposure apparatus with a substrate holding mechanism
US5093579A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 1990 |
| Grant date | Mar 3, 1992 |
| Priority date | — |
| Expiry date | Jul 11, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate holding device includes a holding table having a reduced pressure passageway; a pressure gauge for measuring a value related to the pressure in the reduced pressure passageway; a pump for producing a pressure difference between a first surface of the substrate to be attracted to the holding table and a second surface of the substrate not to be attracted to the holding table; a valve which can be opened/closed for control of the pressure in the reduced pressure passageway; a pressure control system for controlling the opening/closing of the valve on the basis of an output corresponding to the value measured by the pressure gauge; and a temperature control system for controlling the temperature of the holding table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.