Multiphase printing for E-beam lithography
US5103101A · kind A · utility
105Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1991 |
| Grant date | Apr 7, 1992 |
| Priority date | — |
| Expiry date | Mar 4, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31762
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for a raster scan particle or light beam lithography system for writing in multiple passes interleaved in such a manner as to achieve a composite result nearly identical to normal single pass raster scan writing with overlapped spots. Multiple pass writing, achieved with little or no degradation or throughput or lithography quality, provides an ideal platform for implementation of known image averaging techniques to improve lithography quality. This technique is combined with the known writing technique of "Virtual Addressing" to improve resolution with little or no degradation of throughput.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.