ETEC SYSTEMS, INC.
🏢 View company profile →63Patents
0Active
63Granted
38Portfolio score
Filing activity: Aug 8, 1989 → Sep 29, 2000
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5533170A | Rasterizer for a pattern generation apparatus | Physics | 131 | Expired |
| US5847959A | Method and apparatus for run-time correction of proximity effects in pattern generation | Emerging Cross-Sectional Technologies | 119 | Expired |
| US5103101A | Multiphase printing for E-beam lithography | Electricity | 105 | Expired |
| US5393987A | Dose modulation and pixel deflection for raster scan lithography | Electricity | 65 | Expired |
| US5227839A | Small field scanner | Physics | 63 | Expired |
| US5876902A | Raster shaped beam writing strategy system and method for pattern generation | Emerging Cross-Sectional Technologies | 57 | Expired |
| US5386221A | Laser pattern generation apparatus | Electricity | 49 | Expired |
| US5246800A | Discrete phase shift mask writing | Physics | 37 | Expired |
| US6037967A | Short wavelength pulsed laser scanner | Electricity | 34 | Expired |
| US6220914A | Method of forming gated photocathode for controlled single and multiple electron beam emission | Electricity | 32 | Expired |
| US5255051A | Small field scanner | Physics | 32 | Expired |
| US6274290A | Raster scan gaussian beam writing strategy and method for pattern generation | Emerging Cross-Sectional Technologies | 27 | Expired |
| US5757469A | Scanning lithography system haing double pass Wynne-Dyson optics | Physics | 27 | Expired |
| US6023060A | T-shaped electron-beam microcolumn as a general purpose scanning electron microscope | Electricity | 26 | Expired |
| US5304888A | Mechanically stable field emission gun | Electricity | 26 | Expired |
| US6200736A | Photoresist developer and method | Physics | 23 | Expired |
| US5177402A | Arc suppressor for electron gun | Electricity | 23 | Expired |
| US6259106A | Apparatus and method for controlling a beam shape | Electricity | 21 | Expired |
| US6281508A | Precision alignment and assembly of microlenses and microcolumns | Electricity | 20 | Expired |
| US5784925A | Vacuum compatible linear motion device | Emerging Cross-Sectional Technologies | 19 | Expired |
| US5327338A | Scanning laser lithography system alignment apparatus | Physics | 19 | Expired |
| US6215128A | Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography | Electricity | 19 | Expired |
| US6084706A | High efficiency laser pattern generator | Physics | 17 | Expired |
| US5345085A | Method and structure for electronically measuring beam parameters | Electricity | 16 | Expired |
| US6262429A | Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field | Electricity | 16 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.