Patent · US Expired

Process for measuring the dimensions of a spacer

US5103104A · kind A · utility

12Cited by

5References

2Claims

0Family size

Assignee

French State, Minister of Post, Telecommunications and Space · FR

Inventors

Annie Tissier · Scottsdale, US
Jean Galvier · Saint-Martin-d'Hères, FR

Key dates

Filing date	Dec 20, 1990
Grant date	Apr 7, 1992
Priority date	—
Expiry date	Dec 20, 2010

Classification

Technology area (CPC G)Physics
CPC primaryG01B11/024
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A process for measuring the dimensions of a spacer consisting in forming in a substrate (1) an array of parallel stripes (2), having a rectangular cross section; forming spacers (7) on the lateral edges (6) of the parallel stripes (2); lighting the array through a monochromatic light beam to supply a diffraction pattern, the envelope of which exhibits a major lobe and secondary lobes; measuring the sum of light intensities of a predetermined number of spots pertaining to the first secondary lobe; and deducting therefrom the width l and angle .theta. of the spacer (7) according to the following formulas: EQU l=k1.times.IL1+k2 EQU .theta.=k3.times.IL1+k4

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.