Birefringent structures formed by photo-exposure of polymer films and method for fabrication thereof
US5105298A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 12, 1989 |
| Grant date | Apr 14, 1992 |
| Priority date | — |
| Expiry date | Jul 12, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A birefringent structure useful as a waveplate, grating, a hologram, a beam separator, a digital data storage medium or the like is formed by photo-exposure causing photo-reaction between photons and polymeric structures. In a specific embodiment, birefringence is induced by applying optical energy to a polymer film such as a polysilane with sufficient intensity to excite nonlinear absorption in the polymer film such that a pattern of the exposing optical energy is recorded in the polymer film. The optical energy is of a distinct polar This invention was made under contract with or supported by the United States Air Force office of Scientific Research under Contract No. AFOSR-88-0354. The Government has certain rights in this invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.