DC reactively sputtered antireflection coatings
US5105310A · kind A · utility
55Cited by
11References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 11, 1990 |
| Grant date | Apr 14, 1992 |
| Priority date | — |
| Expiry date | Oct 11, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/116
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.