Eric R. Dickey
30Patents
14h-index
33Co-inventors
81Inventor score
Filing activity: Dec 20, 1989 → May 4, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8187679B2 | Radical-enhanced atomic layer deposition system and method | Chemistry; Metallurgy | 496 | Active |
| US5618388A | Geometries and configurations for magnetron sputtering apparatus | Chemistry; Metallurgy | 75 | Expired |
| US5504389A | Black electrode TFEL display | Emerging Cross-Sectional Technologies | 63 | Expired |
| US5712528A | Dual substrate full color TFEL panel with insulator bridge structure | Electricity | 60 | Expired |
| US5372874A | DC reactively sputtered optical coatings including niobium oxide | Emerging Cross-Sectional Technologies | 56 | Expired |
| US5105310A | DC reactively sputtered antireflection coatings | Physics | 55 | Expired |
| US7923068B2 | Fabrication of composite materials using atomic layer deposition | Emerging Cross-Sectional Technologies | 55 | Active |
| US5270858A | D.C. reactively sputtered antireflection coatings | Physics | 50 | Expired |
| US5450238A | Four-layer antireflection coating for deposition in in-like DC sputtering apparatus | Chemistry; Metallurgy | 37 | Expired |
| US5879519A | Geometries and configurations for magnetron sputtering apparatus | Chemistry; Metallurgy | 35 | Expired |
| US5470452A | Shielding for arc suppression in rotating magnetron sputtering systems | Electricity | 25 | Expired |
| US5725746A | Shielding for arc suppression in rotating magnetron sputtering systems | Electricity | 25 | Expired |
| US5106474A | Anode structures for magnetron sputtering apparatus | Electricity | 24 | Expired |
| US5656888A | Oxygen-doped thiogallate phosphor | Chemistry; Metallurgy | 18 | Expired |
| US5581150A | TFEL device with injection layer | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6358632B1 | TFEL devices having insulating layers | Emerging Cross-Sectional Technologies | 13 | Expired |
| US5022726A | Magnesium film reflectors | Emerging Cross-Sectional Technologies | 10 | Expired |
| US8137464B2 | Atomic layer deposition system for coating flexible substrates | Chemistry; Metallurgy | 8 | Active |
| US8202366B2 | Atomic layer deposition system utilizing multiple precursor zones for coating flexible substrates | Chemistry; Metallurgy | 4 | Active |
| US8637117B2 | Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system | Chemistry; Metallurgy | 2 | Active |
| US9263359B2 | Mixed metal-silicon-oxide barriers | Electricity | 2 | Active |
| US9469901B2 | Atomic layer deposition method utilizing multiple precursor zones for coating flexible substrates | Chemistry; Metallurgy | 2 | Active |
| US9647208B2 | Low voltage embedded memory having conductive oxide and electrode stacks | Physics | 1 | Active |
| US9238868B2 | Atomic layer deposition method for coating flexible substrates | Chemistry; Metallurgy | 1 | Active |
| US9435028B2 | Plasma generation for thin film deposition on flexible substrates | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.