Patent · US Expired

Positive photoresist composition containing alkali-soluble phenolic resin, photosensitive quinonediazide compound and sulfonyl containing compound

US5106718A · kind A · utility

14Cited by

5References

3Claims

0Family size

Assignee

Ciba-Geigy · US

Inventors

Ekkehard Bartmann · Langen (Hessen), DE
Reinhard Schulz · Hannover, DE
Horst Munzel · Darmstadt, DE

Key dates

Filing date	Feb 1, 1991
Grant date	Apr 21, 1992
Priority date	—
Expiry date	Feb 1, 2011

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0226
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to positive photoresists based on alkali-soluble phenolic resin and photosensitive quinonediazide compounds which, by means of particular additives, give relief structures produced therewith an increased stability towards changes due to thermal effects.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.