Composite useful in photolithography
US5108874A · kind A · utility
74Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1989 |
| Grant date | Apr 28, 1992 |
| Priority date | — |
| Expiry date | Aug 23, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07D455/04
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The image of an object with opaque and transparent regions having a contrast less than the contrast threshold of a layer of photoresist when light of a predetermined wavelength to which the photoresist is sensitive is passed through the object and onto the layer of photoresist is enhanced in contrast by the provision of a contrast enhancing layer contiguous to the surface of the photoresist to a value above the contrast threshold of the photoresist. The contrast enhancing layer is constituted of an aryl nitrone compound mixed with a suitable binder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.