Patent · US Expired

Target for magnetron-sputtering systems

US5112468A · kind A · utility

11Cited by

2References

7Claims

0Family size

Assignee

Degussa AG · DE

Inventors

Martin Weigert · Lindlar, DE
Lorenz Berchtold · Nuremberg, DE
Stephan Schittny · Alzenau, DE

Key dates

Filing date	Feb 4, 1991
Grant date	May 12, 1992
Priority date	—
Expiry date	Feb 4, 2011

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3405
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Targets for magnetron - sputtering systems with a high utilization of material are obtained from ferromagnetic alloys if the amount of hexagonal structural phase is greater than the cubic phase portion and if the hexagonal prism axis (0001) is aligned preferably vertically to the target surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.