Inventor · Alzenau, DE

Stephan Schittny

3Patents
3h-index
8Co-inventors
43Inventor score

Filing activity: Aug 14, 1987 → May 2, 1997

Most-cited inventions

PatentTitleAreaCited byStatus
US6030514A Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor Chemistry; Metallurgy 29 Expired
US5112468A Target for magnetron-sputtering systems Electricity 11 Expired
US4803046A Method for making targets Chemistry; Metallurgy 5 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.