Nonlinear, optical thin-films and manufacturing method thereof
US5113473A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 3, 1991 |
| Grant date | May 12, 1992 |
| Priority date | — |
| Expiry date | Sep 3, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/355
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Nonlinear, optical thin-films comprising a plurality of island structures of semiconductor ultra-fine particles and a plurality of continuous films of an optically transparent material, said island structures and said continuous films being applied alternately on a substrate. A method for manufacturing nonlinear, optical thin-films comprising the steps of: (a) providing a substrate; (b) depositing an island structure of semiconductor ultra-fine particles on the substrate or a continuous film; and (c) depositing the continuous film of optically transparent substance on the island structure; (d) the steps (b) and (c) of depositing an island structure and the continuous film being performed alternately.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.