Apparatus and method for locating target area for electron microanalysis
US5118941A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 23, 1991 |
| Grant date | Jun 2, 1992 |
| Priority date | — |
| Expiry date | Apr 23, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2522
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Target area on a specimen surface is located in an electron microanalyzer system that includes an electron energy analyzer and an analyzer detector. An electron gun impinges a rastering beam of incident electrons across the surface, a secondary electron detector provides corresponding signals for producing a scanning electron microscope image of the surface. Backscattered electrons effected from the incident electrons are passed through the analyzer for producing a further image that is superimposed on the SEM image to locate the target area to be subject to a separate microanalysis. Particularly for an electrically insulating specimen surface, the images are produced in a single frame of rastering, and surface area and beam current are sufficient to produce the images without substantial charge buildup.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.