Exposure method and apparatus
US5121160A · kind A · utility
61Cited by
15References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 18, 1991 |
| Grant date | Jun 9, 1992 |
| Priority date | — |
| Expiry date | Jun 18, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70058
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any change in the size of the laser beam; and a device for directing the laser beam to a substrate to be exposed, the directing device including a compensator responsive to an output signal from the detector for substantially correcting the change in the beam size.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.