Apparatus for coating materials in a vacuum chamber
US5121707A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 10, 1990 |
| Grant date | Jun 16, 1992 |
| Priority date | — |
| Expiry date | Aug 10, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/564
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An aluminium vacuum deposition machine for coating parts of lead frames, having a vacuum chamber containing the lead frames and aluminium to be vaporized. To reduce the incidence of imperfections in the aluminium coatings, a meissner trap is positioned within the vacuum chamber itself rather than or in addition to a meissner trap adjacent to a diffusion pump. Also, to reduce the thermal mass within the chamber, a support jig for the lead frames comprises a pair of end rings and a bracer member joining the end rings and holding them apart. Two pairs of spaced rollers are arranged in the chamber so that each ring rests on a respective pair of rollers, and the rollers are driven so that the support jig is rotated during vacuum deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.