Graphoepitaxy using energy beams
US5122223A · kind A · utility
20Cited by
8References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 1984 |
| Grant date | Jun 16, 1992 |
| Priority date | — |
| Expiry date | Dec 10, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S148/131
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Improvements to graphoepitaxy include use of irradiation by electrons, ions or electromagnetic or acoustic radiation to induce or enhance the influence of artificial defects on crystallographic orientation; use of single defects; and use of a relief structure that includes facets at 70.5 and/or 109.5 degrees.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.