Arrangement for the coating of substrates

US5122252A · kind A · utility

Assignee

• Leybold GmBH · DE

Inventors

• Rudolph Latz · Frankfurt am Main, DE
• Michael Scherer · Crimmitschau, DE

Key dates

• Filing date: Jan 9, 1991
• Grant date: Jun 16, 1992
• Expiry date: Jan 9, 2011

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J37/3405
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to an arrangement for the vapor deposition of thin layers on a substrate. This arrangement comprises a magnetron cathode with a target disposed opposite the substrate. With the aid of a particle generator ions of a reactive gas are generated and accelerated toward the substrate where a reaction takes place between target particles and reactive gas particles.