Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
US5128230A · kind A · utility
31Cited by
16References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 23, 1991 |
| Grant date | Jul 7, 1992 |
| Priority date | — |
| Expiry date | Jan 23, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0048
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.