Anthony Zampini
66Patents
16h-index
45Co-inventors
84Inventor score
Filing activity: Nov 25, 1980 → Jun 23, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4323453A | Tube sheets for permeators | Chemistry; Metallurgy | 63 | Expired |
| US6503689B2 | Antireflective composition | Emerging Cross-Sectional Technologies | 42 | Expired |
| US4575385A | Permeation modified gas separation membranes | Performing Operations; Transporting | 39 | Expired |
| US4472175A | Asymmetric gas separation membranes | Performing Operations; Transporting | 37 | Expired |
| US6599951B2 | Antireflective porogens | Emerging Cross-Sectional Technologies | 35 | Expired |
| US4486202A | Asymmetric gas separation membranes | Performing Operations; Transporting | 33 | Expired |
| US5178986A | Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol | Physics | 32 | Expired |
| US5128230A | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate | Physics | 31 | Expired |
| US4654055A | Asymmetric gas separation membranes | Performing Operations; Transporting | 27 | Expired |
| US6492086B1 | Phenolic/alicyclic copolymers and photoresists | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6576681B2 | Antireflective porogens | Emerging Cross-Sectional Technologies | 22 | Expired |
| US4484935A | Permeation modified membrane | Chemistry; Metallurgy | 17 | Expired |
| US5266440A | Photoresist composition with aromatic novolak binder having a weight-average molecular weight in excess of 1500 Daltons | Physics | 17 | Expired |
| US6787286B2 | Solvents and photoresist compositions for short wavelength imaging | Emerging Cross-Sectional Technologies | 17 | Expired |
| US4468502A | Cross-linked polyphenylene oxide | Performing Operations; Transporting | 17 | Expired |
| US6596405B2 | Antireflective porogens | Emerging Cross-Sectional Technologies | 16 | Expired |
| US5939511A | Resin purification process | Chemistry; Metallurgy | 15 | Expired |
| US4468501A | Cross-linked polyphenylene oxide | Performing Operations; Transporting | 15 | Expired |
| US4983492A | Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol | Physics | 14 | Expired |
| US5529880A | Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound | Physics | 14 | Expired |
| US4530703A | Cross-linked polyarylene oxide membranes | Chemistry; Metallurgy | 14 | Expired |
| US5238776A | Photoresist composition containing block copolymer resin and positive-working o-quinone diazide or negative-working azide sensitizer compound | Physics | 13 | Expired |
| US5571886A | Aromatic novolak resins | Physics | 11 | Expired |
| US4468503A | Amino ketone cross-linked polyphenylene oxide | Performing Operations; Transporting | 11 | Expired |
| US5723254A | Photoresist with photoactive compound mixtures | Physics | 10 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.