Device manufacture involving lithographic processing
US5130213A · kind A · utility
47Cited by
4References
63Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 23, 1990 |
| Grant date | Jul 14, 1992 |
| Priority date | — |
| Expiry date | Mar 23, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31791
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.