Method and apparatus for controlling charged particle beams in charged particle beam exposure system
US5134300A · kind A · utility
10Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 22, 1991 |
| Grant date | Jul 28, 1992 |
| Priority date | — |
| Expiry date | Aug 22, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3026
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam exposure system employs a continuously moving stage technique and a double deflection technique. The system stably deflects charged particle beams and reliably exposes a sample to the beams with no overflow. The system positively moves a major deflector from one subfield to a particular position of another subfield on the sample for period corresponding to a settling time that is usually needed for a subfield-to-subfield jump of the major deflector, and then exposes the sample to the beams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.